Cluster PECVD Tools

Cluster PECVD tools are integral in depositing uniform thin films onto wafers using plasma-enhanced chemical vapor deposition. They support consistent semiconductor production by ensuring high-quality film layers.

  1. PLASMATHERM VLR 700

    Cluster PECVD Tools

    PLASMATHERM VLR 700

    Single Chamber PECVD. Mixed Frequency Deposition (MFD) Both High Frequency (13.56 MHz) and Low Frequency (50-460 kHz) RF power delivered both electrodes.

  3. AMAT HDP Centura (#615)

    Cluster PECVD Tools

    AMAT HDP Centura (#615)

    Software: Win 10

    OR 4000 WTM Controller

    3x ENI Generator Racks

    Chiller INR-498-011D

    2x Remote Monitor

    High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F

    Software: Win 10

    OR 4000 WTM Controller

    3x ENI Generator Racks, Chiller INR-498-011D

    2x Remote Monitor

    High Density Plasma Process

    Process Chambers: A,B,C

    Orienter chamber F

    System: 1x Mainframe

    3x process chamber

    1x Controller Rack

    1x Chiller

    3x ENI Generator Racks (Converted to separate water supply each Generator)

    1x Controller Rack

    x Chiller

    3x ENI Generator Racks (Converted to separate water supply each Generator)

    AMAT Vita/Delphin Controller

    Tool will be sold without Software

  4. APPLIED MATERIALS Centura TPCC EPN

    Cluster PECVD Tools

    APPLIED MATERIALS Centura TPCC EPN

    APPLIED MATERIALS Centura TPCC EPN 

    • Serial Number 21693; Manufactured in 2011
    • Electro Polished Nickel Frame & Modules
    • 2ea ENP Centura Loadlocks for 200mm Wafers
    • Wafer Transfer Chamber with HP Robot
      • High Temperature Quartz End Effector
      • On the Fly Wafer Centering
      • 2ea TanOx Chambers - Positions C & D
      • 2ea ENP Fast Cooldown Chambers
      • V452 Main Control Board
      • Gas Panel with 2ea Gas Pallets
      • Interconnect Cables
      • AC Distribution Rack – 160A
      • Through the Wall Installation Kit
      • Please Inquire for Additional Details

Popular Manufacturers

Applied Materials AMAT Plasma-Therm

Common Applications

semiconductor wafer production

microelectronic device fabrication

thin film coatings

optical coatings

MEMS manufacturing

nanotechnology applications

Buying Guide

Cluster PECVD Tools Buying Considerations

  • Assess chamber capacity to match your production volume needs.
  • Ensure compatibility with targeted thin film materials.
  • Evaluate plasma uniformity for consistent film quality.
  • Consider automation capabilities for higher throughput.
  • Check for integration options with existing manufacturing systems.

Frequently Asked Questions

What is a Cluster PECVD tool?
A Cluster PECVD tool is a system used to deposit thin films on semiconductor wafers using plasma-enhanced chemical vapor deposition.
Why are Cluster PECVD tools used in semiconductor manufacturing?
They provide precise control over film deposition, essential for creating high-performance semiconductor devices.
What materials can be deposited using Cluster PECVD tools?
Common materials include silicon nitride, silicon dioxide, and various polymers.
How do Cluster PECVD tools improve production efficiency?
They allow for simultaneous processing of multiple wafers, reducing cycle times and increasing throughput.