 |
Item ID |
Photo |
Short Description |
Product Type / Details |
#
|
Price |
Notes |
Location |
Make |
Model |
|
|
$ |
|
 |
254171
|
ASML
|
ASML |
5500 / 275D |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254474
|
ASML
|
ASML |
AT400C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254366
|
ASML
|
ASML |
AT850C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254365
|
ASML
|
ASML |
AT850C |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254257
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254256
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254107
|
ASML
|
ASML |
NXT1950i |
in Wafer Steppers
|
1
|
|
|
 |
Malta, New York |
|
 |
254111
|
ASML
|
ASML |
XT1400E |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
254110
|
ASML
|
ASML |
XT1900Gi |
in Wafer Steppers
ASML XT1900Gi, 300mm, s/n: 5884:Immersion scanner
|
1
|
|
|
 |
Singapore |
|
 |
254199
|
ASML
|
ASML |
Yieldstar S-200B |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254167
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254164
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254163
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
AXCELIS PCU 200, 200mm, s/n: PU6C289X:PHOTOSTABILIZER
|
1
|
|
|
 |
Singapore |
|
 |
254165
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254166
|
Axcelis Technologies
|
Axcelis Technologies |
PCU 200 |
in Lithography Equipment
|
1
|
|
|
 |
Singapore |
|
 |
254917
|
Canon
|
Canon |
5500iZ |
in Wafer Steppers
CANON 5500iZ:still in production, deinstallation date 01.02.25 1) no harddisk in stepper Workstation (EWS) installed: backup of stepper system parameter available 2) No Hg-lamp installed 3) No UPS unit installed. 4) all batteries, C-oil and cooling fluid will be removed before shipping because of safety regulations 5) no MO drive installed - wafer handling and wafer chuck configured for 12" wafer processing - SMIF pod reticle changer - 6" reticle size
|
1
|
|
|
N* |
Regensburg, Bavaria |
|
 |
249646
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; no transportation locks available; major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT (see pictures) no UPS installed. No printer installed. No MO-drive. EOL: optical parts
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
249647
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; no transportation locks available; major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT (see pictures) no UPS installed. No printer installed. No MO-drive EOL: optical parts
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250700
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250701
|
Canon
|
Canon |
3000i4 |
in Wafer Steppers
Canon FPA 3000 i4 Stepper :Configuration: left inline system; 8" wafer chuck; Nikon Type Reticle changer; 6" Reticle major hardware and software changes in control system: EWS type changed to HP B180, O/S changed to HP-UX 10.20, original X-Terminal replaced by a Windows PC + 17" touchscreen TFT Hg lamp will be removed prior shipping Coolant will be removed prior shipping Batteries will be removed prior shipping no UPS installed. No printer installed. No MO-drive EOL: optical parts Last Time in production: 05/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254473
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254364
|
InnerSense
|
InnerSense |
Load Port - P/N: ALP613A |
in Lithography Equipment
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254247
|
KLA-Tencor
|
KLA-Tencor |
Archer A500 AIM |
in Lithography Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
255101
|
KLA-Tencor
|
KLA-Tencor |
Archer A500 LCM |
in Lithography Equipment
|
1
|
|
|
 |
Santa Clara, California |
|
 |
255100
|
KLA-Tencor
|
KLA-Tencor |
Archer A500 LCM |
in Lithography Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
253369
|
KLA-Tencor
|
KLA-Tencor |
5200 |
in Lithography Equipment
|
1
|
|
|
 |
Burlington, Vermont |
|
 |
254368
|
KLA-Tencor
|
KLA-Tencor |
TERON 650 |
in Lithography Equipment
|
1
|
|
|
 |
Malta, New York |
|
 |
254226
|
Lasertec
|
Lasertec |
BI100 |
in Lithography Equipment
Lasertec BI100, s/n: BA002A408JR:EUV Reticle Back Side Inspection
|
1
|
|
|
 |
Malta, New York |
|
 |
254329
|
Nikon
|
Nikon |
S208D |
in Wafer Steppers
|
1
|
|
|
 |
Singapore |
|
 |
248319
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573113:Nikon, NSR-2205EX14C, 200mm, S/N 7573113
|
1
|
|
|
 |
Singapore |
|
 |
248320
|
Nikon
|
Nikon |
NSR-2205EX14C |
in Wafer Steppers
Nikon, NSR-2205EX14C, 200mm, S/N 7573120:Nikon, NSR-2205EX14C, 200mm, S/N 7573120
|
1
|
|
|
 |
Singapore |
|
 |
249907
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732039. LKSC760:NIKON Main Body
|
1
|
|
|
 |
Singapore |
|
 |
247027
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: 8732048:NIKON, NSR-S208D, 300mm, s/n: 8732048 Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
247605
|
Nikon
|
Nikon |
NSR-S208D |
in Wafer Steppers
NIKON, NSR-S208D, 300mm, s/n: S62 0290202:Lithography Step and repeat scanning system
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
249036
|
Suss MicroTec
|
Suss MicroTec |
ACS200 Gen3 |
in Photoresist Coaters
Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm:Suss ACS200 Gen3, sn: ACS300GEN2-001151, 300 mm Suss spray coater
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
248241
|
Suss Tamarack Scient
|
Suss Tamarack Scient |
TAMARACK M423 EXCIMER |
in Wafer Steppers
|
1
|
|
|
 |
East Fishkill, New York |
|
 |
254475
|
Tel
|
Tel |
ACT12 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254137
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250840
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250841
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250843
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250839
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250847
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250842
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250844
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250846
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250849
|
Tel
|
Tel |
ACT8 |
in Photoresist Coaters
TEL ACT8, 200mm, sn: 9211869:TCDEV-24 JUSTIN ACT TRACK FOR 0.25um (former TCDEV-39)
|
1
|
|
|
 |
Singapore |
|
 |
254477
|
Tel
|
Tel |
LITHIUS PRO-I |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
254106
|
Tel
|
Tel |
Lithius ProV |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
254101
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110231:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254102
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V110233:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254103
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
TEL Lithius ProVi, 300mm, s/n: V120318:Immersion Coat and Develop
|
1
|
|
|
 |
Malta, New York |
|
 |
254240
|
Tel
|
Tel |
Lithius ProVi |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
254242
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
255441
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255442
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
255443
|
Tel
|
Tel |
LITHIUS |
in Photoresist Coaters
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
251087
|
Tel
|
Tel |
MARK8 |
in Photoresist Coaters
|
1
|
|
|
 |
Singapore |
|
 |
250488
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A1 M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250489
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last Time in production 1/1/24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250490
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
250491
|
Tel
|
Tel |
MK7-S |
in Lithography Equipment
TEL MK7-S Coater_Developer:missing parts: 2 resist pumps, 1Developer Line Add. Info: TYP A M/C Typ FC-9801F#2 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Shinwa CP-I Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes Last time in production: 01.01.24
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254104
|
Tel
|
Tel |
PROi |
in Photoresist Coaters
TEL PROi, 300mm, s/n: N100355:Cot / DEV
|
1
|
|
|
 |
Dresden, Saxony |
|
 |
254241
|
Tel
|
Tel |
ProZ |
in Photoresist Coaters
|
1
|
|
|
 |
Malta, New York |
|
 |
249204
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
LITHIUS I+ |
in Photoresist Coaters
TEL, LITHIUS I+, 300mm, S/N G481358:TEL, LITHIUS I+, 300mm, S/N G481358
|
1
|
|
|
 |
Singapore |
|
 |
233207
|
Tokyo Electron Ltd
|
Tokyo Electron Ltd |
Lithius |
in Photoresist Coaters
TEL, Lithius, 300mm, S/N G260815:TEL, Lithius, 300mm, S/N G260815
|
1
|
|
|
 |
Singapore |
|
 |
245289
|
Tokyo Electron Limit
|
Tokyo Electron Limit |
8181523 |
in Photoresist Coaters
TEL, Mark 8, 200mm, S/N 8181523:TEL, Mark 8, 200mm, S/N 8181523 SOG Coater. 2 coaters only.
|
1
|
|
|
 |
Singapore |
|